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1200℃ Dual Zone CVD Furnace
  • 1200℃ Dual Zone CVD Furnace
  • 1200℃ Dual Zone CVD Furnace
  • 1200℃ Dual Zone CVD Furnace
  • 1200℃ Dual Zone CVD Furnace
  • 1200℃ Dual Zone CVD Furnace

    Model:KJ-1200X-II

    Description:

    KJ-1200X-II is a co-evaporation multilayer deposition tube furnace with dual temperature zones with a lifting dual channel feeding system. The lifting dual channel feeding system can load 4 evaporation crucible boats of different materials

    Specific Introduction:
        KJ-1200X-II is a co-evaporation multilayer deposition tube furnace with dual temperature zones with a lifting dual channel feeding system. The lifting dual channel feeding system can load 4 evaporation crucible boats of different materials, and Two evaporation crucible sources can be fed into the tube furnace for co-evaporation or reactive evaporation at the same time. The dual-temperature zone tube furnace can achieve rapid heating, and different temperature gradients can be created by setting different heating temperatures for each temperature zone to achieve evaporative deposition. The dual-channel feeding system can push and pull out two crucibles loaded with different evaporation materials together under program control to realize co-evaporation or reactive evaporation, which is especially suitable for the preparation of multilayer two-dimensional crystal materials.
    Parameters:
    Tube furnace Dual temperature zone tube furnace: Two independent temperature control systems control the temperature of each temperature zone independently
    Voltage: 220V AC 50/60Hz
    Power: 3KW
    Length of heating zone: 440mm
    Length of constant temperature zone: 300mm
    Temperature graph (measured when the two temperature zones are set at 800℃, for reference only)
    Furnace tube material: high purity quartz tube
    Standard furnace tube size: Φ100 (outer) × Φ94 (inner) × 640 (length)
    Maximum working temperature: 1200℃ (<1h)
    Continuous working temperature: 1100℃
    Temperature control accuracy: ±1℃
    Recommended heating rate: 10℃/min
    Crucible pushing mechanism (lifting double channel feeding system)
    An armored thermocouple passes into the furnace tube through the left end flange and is connected to the crucible to realize real-time temperature monitoring
    The lifting dual-channel feeding system is placed in a hollow vacuum chamber, and the upper part is sealed with a stainless steel vacuum flange. The two ends are also connected with the crucible pushing device and the tube furnace to ensure that the feeding is in a vacuum state. Or operate under protective atmosphere
    Two independent small quartz tubes are installed at the right end of the vacuum chamber of the feeding system and the tube furnace connection flange
    Up to 4 crucibles can be placed in the lifting double-channel feeding system. The push system can alternately send 4 different evaporation sources into the quartz tube one by one, or send 2 crucible evaporation sources of different materials together Enter, and accurately push into two independent small quartz tubes, find the required evaporation temperature for co-evaporation or reactive evaporation, to ensure the repeatability and stability of the experiment
    Crucible push control system Using PLC touch screen control
    The crucible's moving speed and position are controlled by a stepping motor, and the sampling position and speed are adjustable
    The minimum moving displacement of the crucible can be controlled to 1mm
    The maximum moving distance of the crucible is 200mm
    Vacuum gauge Mechanical pressure gauge + digital pressure gauge
    Vacuum pump Vacuum degree: 10E-2 torr (using mechanical pump), 10-E5 torr (using molecular pump)
    Mixing system This set of equipment is equipped with a 2-way mixing system
    Maximum output power: 18W
    Working temperature: 5-45℃
    Accuracy: ±1%FS
    Mass flow meter range: 1:0-100sccm 2:1-199sccm
    Can choose 1-5 gas supply system according to customer requirements
    Cooling system Standard 16L circulating water cooling system
    size 2600mm(L) x 600mm(W) x 900mm(H) 
    Warranty One-year warranty, lifetime maintenance
    Quality Certification CE certification
    All electrical components (>24V) have passed UL / MET / CSA certification
    If the customer pays the certification fee, the company guarantees that a single device passes the German TUV certification or CAS certification
    Precautions for use The air pressure in the furnace tube cannot be higher than 0.02MPa
    Due to the high internal pressure of the gas cylinder, a pressure reducing valve must be installed on the gas cylinder when passing gas into the furnace tube. It is recommended to purchase a pressure reducing valve from our company. The pressure reducing valve range of our company is 0.01MPa-0.1MPa. Time will be more precise and safe
    When the temperature of the furnace body is higher than 1000℃, the furnace tube must not be in a vacuum state, and the air pressure in the furnace tube must be equal to the atmospheric pressure and be kept at normal pressure.
    The gas flow into the furnace tube must be less than 200SCCM to avoid the impact of the cold atmosphere on the heated quartz tube
    Long-term use temperature of quartz tube <1100℃
    For the sample heating experiment, it is not recommended to close the exhaust valve and intake valve at the flange end of the furnace tube. If you need to close the gas valve to heat the sample, you must always pay attention to the indication of the pressure gauge. If the indication of the air pressure is greater than 0.02MPa, the vent valve must be opened immediately to prevent accidents (such as furnace tube rupture, flange flying, etc.)
    Application examples This tube furnace has many uses:
    Thermal evaporation: Put the evaporating material into a crucible, and accurately find the required evaporation temperature by moving the crucible
    HPCVD: Reactive vapor deposition is achieved by introducing reactive gas
    Co-evaporation deposition or reactive evaporation deposition: the use of a unique dual-channel feed device can realize simultaneous feeding of two evaporation sources to achieve co-evaporation deposition or reactive evaporation deposition
    Multi-layer two-dimensional crystals: This set of equipment can realize the preparation of multi-layer two-dimensional crystals (selenide sulfide, etc.), which is convenient and simple to operate, and the experiment is more accurate and repeatable.

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    Tel Number

    180-3717-8440

    Email

    web@kejiafurnace.com

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